Laboratory of Thin Film Technology
|Location: W. Ostwaldi Str 1, Tartu
Employees of the laboratory
Laboratory of Thin Film Technology is concentrated on research and development of methods for preparation and characterization of thin and ultra-thin solid films, application of these methods and teaching of students in this field. Application areas of the materials that are being studied range from anticorrosion coatings to micro- and nanoelectronics.
Equipment for electron beam evaporation, magnetron sputtering and atomic layer deposition of thin solid films as well as for chemical vapor deposition of graphene is in the possession of the the personnel of the laboratory. Formation of thin films in atomic layer deposition and electron beam evaporation processes can be monitored with subnanometer resolution in real time. For characterization of materials, X-ray diffraction, X-ray reflection, X-ray fluorescence, scanning electron microscopy, electron probe microanalysis, spectroscopic ellipsometry and scanning probe methods can be used. Electrical properties and gas sensitivity of thin films can also be measured at the Laboratory of Thin Film Technology.
In the Laboratory of Thin Film Technology:
- Novel methods for real-time characterization of atomic layer deposition processes have been developed
- Technologies for preparation of efficient anti-corrosion coatings have been advanced
- New methods for deposition of dielectrics with high dielectric constant for nanoelectronic devices have been developed
- Methods for chemical vapor deposition of graphene have been implemented.
Aile Tamm, Head of Laboratory, Senior Research Fellow in Material Science, aile.tamm [ät] ut.ee, phone: 737 4662