Publications from 2019-2012 by the laboratory personnel

Dean's Office

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hv.dekanaat [at] ut.ee

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Jakobi 2, rooms 116–121, 51005 Tartu
Institute of History and Archaeology

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Jakobi 2, 51005 Tartu
Institute of Estonian and General Linguistics

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Jakobi 2, 51005 Tartu
Institute of Philosophy and Semiotics

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filosoofia.semiootika [at] ut.ee

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Jakobi 2, rooms 309–352, 51005 Tartu
Institute of Cultural Research

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(+372) 737 5223

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kultuuriteadused [at] ut.ee

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Ülikooli 16, 51003 Tartu
School of Theology and Religious Studies

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us.ut.ee

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+372 737 5301

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us [at] ut.ee

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Ülikooli 18–310, 50090 Tartu
College of Foreign Languages and Cultures

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maailmakeeled.ut.ee

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keeled [at] ut.ee

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Lossi 3, 51003 Tartu
Viljandi Culture Academy

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+372 435 5232

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kultuur [at] ut.ee

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Posti 1, 71004 Viljandi

Dean's Office

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+ 372 737 5900

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sotsiaalteadused [at] ut.ee

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Lossi 36, 51003 Tartu
Institute of Education

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+372 737 6440

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haridus [at] ut.ee

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Salme 1a–29, 50103 Tartu
Johan Skytte Institute of Political Studies

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skytte.ut.ee

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skytte [at] ut.ee

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Lossi 36–301, 51003 Tartu
School of Economics and Business Administration

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majandus.ut.ee

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majandus [at] ut.ee

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J. Liivi 4, 50409 Tartu
Institute of Psychology

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psychology.ut.ee

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psyhholoogia [at] ut.ee

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Näituse 2, 50409 Tartu
School of Law

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oi [at] ut.ee

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Näituse 20–324, 50409 Tartu
Institute of Social Studies

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yti.ut.ee

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+372 737 5188

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yhiskonnateadused [at] ut.ee

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Lossi 36, 51003 Tartu
Narva College

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+372 740 1900

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college [at] narva.ut.ee

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Raekoja plats 2, 20307 Narva
Pärnu College

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+372 445 0520

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info [at] pc.ut.ee

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Ringi 35, 80012 Pärnu

Dean's Office

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+372 737 5326

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med [at] ut.ee

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Ravila 19, 50411 Tartu
Institute of Biomedicine and Translational Medicine

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biomeditsiin.ut.ee

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+372 737 4210

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bsmi [at] ut.ee

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Biomeedikum, Ravila 19, 50411 Tartu
Institute of Pharmacy

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farmaatsia.ut.ee

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+372 737 5286

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pharmacy [at] ut.ee

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Nooruse 1, 50411 Tartu
Institute of Dentistry

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hambaarstiteadus.ut.ee

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+372 731 9856

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Raekoja plats 6, 51003 Tartu
Institute of Clinical Medicine

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clinicalmedicine.ut.ee

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kmi [at] ut.ee

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L. Puusepa 8, 50406 Tartu
Institute of Family Medicine and Public Health

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tervis.ut.ee

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+372 737 4190

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dph [at] ut.ee

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Ravila 19, 50411 Tartu
Institute of Sport Sciences and Physiotherapy

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www.kk.ut.ee

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+372 737 5360

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kkdek [at] ut.ee

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Jakobi 5–205, 51005 Tartu

Dean's Office

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+372 737 5820

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ltt [at] ut.ee

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Vanemuise 46–208, 51005 Tartu
Institute of Computer Science

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cs.ut.ee

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ics [at] ut.ee

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J. Liivi 2, 50409 Tartu
Estonian Marine Institute

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mereinstituut.ut.ee

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+372 671 8902

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Mäealuse 14, 12618 Tallinn
Institute of Physics

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W. Ostwaldi 1, 50411 Tartu
Institute of Chemistry

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chem.ut.ee

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+372 737 5261

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chemistry [at] ut.ee

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Ravila 14a, 50411 Tartu
Institute of Mathematics and Statistics

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ltms [at] ut.ee

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J. Liivi 2, 50409 Tartu
Institute of Molecular and Cell Biology

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tymri.ut.ee

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+372 737 5011

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Riia 23, 23b–134, 51010 Tartu
Tartu Observatory

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www.kosmos.ut.ee

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kosmos [at] ut.ee

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Observatooriumi 1, Tõravere, 61602 Tartumaa
Institute of Technology

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Nooruse 1, 50411 Tartu
Institute of Ecology and Earth Sciences

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www.omi.ut.ee

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om [at] ut.ee

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Vanemuise 46, 51003 Tartu

Institutions

Library

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+372 737 5702

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library [at] utlib.ee

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W. Struve 1, 50091 Tartu
Youth Academy

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teaduskool.ut.ee

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+372 737 5581

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teaduskool [at] ut.ee

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Uppsala 10, 51003 Tartu
Institute of Genomics

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genomics.ut.ee

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+372 737 4000

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egv [at] ut.ee

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Riia 23b, 51010 Tartu
Museum

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muuseum.ut.ee

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+372 737 5674

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muuseum [at] ut.ee

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Lossi 25, 51003 Tartu
University of Tartu Natural History Museum and Botanical Garden

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natmuseum.ut.ee

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https://www.ut.ee/en/kontakt/loodusmuuseum-botaanikaaed-0

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+372 737 6076

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loodusmuuseum [at] ut.ee

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Vanemuise 46, 51003 Tartu

Support Units

Administrative Office

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+372 737 5606

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kantselei [at] ut.ee

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Ülikooli 18a, 51005 Tartu
Centre for Entrepreneurship and Innovation

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Lossi 3, III floor, 51003 Tartu
University Office in Tallinn

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Teatri väljak 3, 10143 Tallinn
Estates Office

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Ülikooli 18a, 51005 Tartu
Finance Office

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rahandus [at] ut.ee

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Jakobi 4, 51005 Tartu
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+372 737 6215

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Lossi 3, III floor, 51003 Tartu
Information Technology Office

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+372 737 6000, IT-help: +372 737 5500

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itk [at] ut.ee, arvutiabi [at] ut.ee

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Ülikooli 18a, 51005 Tartu
Human Resources Office

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personal [at] ut.ee

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Ülikooli 18, rooms 302 and 304, 50090 Tartu
Internal Audit Office

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Ülikooli 17–103, 51005 Tartu
Marketing and Communication Office

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+372 737 5687

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info [at] ut.ee, avalik [at] ut.ee

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Ülikooli 18, rooms 102, 104, 209, 210, 50090 Tartu
Office of Academic Affairs

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+372 737 5620

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study [at] ut.ee

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Ülikooli 18, 50090 Tartu
Procurement Office

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+372 737 6632

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tuuli.ilula [at] ut.ee

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Ülikooli 18a, 51005 Tartu
Rector's Office
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+372 737 5600

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rektor [at] ut.ee

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Ülikooli 18, 50090 Tartu
Student Council

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tyye.ut.ee

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+372 737 5400

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info [at] tyye.ee

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Ülikooli 18b, 51005 Tartu
University of Tartu Press

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www.tyk.ee

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+372 737 5945

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tyk [at] ut.ee

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W. Struve 1, 50091 Tartu

University of Tartu Academic Sports Club

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sport.ut.ee

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+372 737 5371

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info [at] tysk.ee

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Ujula 4, 51008 Tartu
Tartu Student Village

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campus.ee

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+372 740 9959

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info [at] kyla.ee

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Narva mnt 25, 51013 Tartu
Tartu Students’ Club

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+372 730 2400

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tym [at] ut.ee

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Kalevi 24, 51010 Tartu
Tartu University Hospital

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www.kliinikum.ee/eng

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kliinikum [at] kliinikum.ee

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L. Puusepa 1a, 50406 Tartu
University of Tartu Foundation

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sihtasutus.ut.ee/en

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+372 737 5852

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triin.vakker [at] ut.ee

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Ülikooli 18, 50090 Tartu
View all other units

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2019

Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates.
Kalam, K.; Seemen, H.; Mikkor, M.; Jõgiaas, T.; Ritslaid, P.; Tamm, A.; Kukli, K.; Kasikov, A.; Link, J.; Stern, R.; Dueñas, S.; Castán, H. Thin Solid Films 669 (2019) 294-300; doi: 10.1016/j.tsf.2018.11.008.
Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel.
Aarik, L.; Kozlova, J.; Mändar, H.; Aarik, J.; Sammelselg, V. Materials Chemistry and Physics 228 (2019) 285-292; doi: 10.1016/j.matchemphys.2019.02.053.
Dispersion of chromia films (eskolaite) in UV-VIS.
Kasikov, A.; Tarre, A.; Marandi, M. Journal of Electrical Engineering 70 (2019) 7S, 36-43; doi: 10.2478/jee-2019–0039.
Electroreduction of oxygen on Nafion®-Coated thin platinum films in acid media.
Sarapuu, A.; Hussain, S.; Kasikov, A.; Pollet, B. G.; Tammeveski, K. Journal of Electroanalytical Chemistry 848 (2019) 113292; doi: https://doi.org/10.1016/j.optmat.2019.109335.
Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films.
Möls, K.; Aarik, L.;Mändar, H.; Kasikov, A.; Niilisk, A.; Rammula, R.; Aarik, J. Optical Materials 96 (2019) 109335; doi: https://doi.org/10.1016/j.optmat.2019.109335.
High-performance microporous carbon from deciduous wood-origin metal carbide.
Käärik, M.; Arulepp, M.; Kook, M.; Kozlova, J.; Ritslaid, P.; Aruväli, J.; Mäeorg, U.; Sammelselg, V.; Leis, J. Microporous and Mesoporous Materials 278 (2019) 14–22; doi: doi.org/10.1016/j.micromeso.2018.11.010.

2018

Atomic layer deposition of ZrO2:Fe2O3 thin films.
Kalam, K.; Seemen, H.; Ritslaid, P.; Tamm, A.; Kukli, K.; Kasikov, A.; Link, J.; Dueñas, S.; Castán, H.; Garcia, H. Beilstein J. Nanotechnol 9 (2018) 119-128; doi: 10.3762/bjnano.9.14.
Oxygen Electroreduction in Alkaline Solution on Pd Coatings Prepared by Galvanic Exchange of Copper.
Lüsi, M; Erikson, H; Merisalu, M; Kasikov, A; Matisen, L; Sammelselg, V; Tammeveski, K. Electrocatalysis 9 (2018) 400–408; doi: 10.1007/s12678-017-0445-z.
Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films.
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Dueñas, Salvador; Castán, Helena; Tamm, Aile; Kukli, Kaupo. ECS Journal of Solid State Science and Technology 7 (9) (2018) 117–122; doi: dx.doi.org/10.1149/2.0041809jss.
Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates.
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena. Thin Solid Films 669 (2018) 294–300; doi: doi.org/10.1016/j.tsf.2018.11.008 .
Phase stability and oxygen-sensitive photoluminescence of ZrO2:Eu,Nb nanopowders.
Kiisk, V.; Puust, L.; Mändar, H.; Ritslaid, P.; Rähn, M.; Bite, I.; Jankovica, D.; Sildos, I.; Jaaniso, R. Materials Chemistry and Physics 214 (2018) 135–142; doi: https://doi.org/10.1016/j.matchemphys.2018.04.090.
Pt nanoparticles sputter-deposited on TiO2/MWCNT composites prepared by atomic layer deposition: Improved electrocatalytic activity towards the oxygen reduction reaction and durability in acid media.
Hussain, S.; Erikson, H.; Kongi, N.; Tarre, A.; Ritslaid, P.; Rähn, M.; Matisen, L.; Merisalu, M., Sammelselg, V.; Tammeveski, K. International Journal of Hydrogen Energy 43 (2018) 10 4967–4977; doi: https://doi.org/10.1016/j.ijhydene.2018.01.143.
The optical properties of transferred graphene and the dielectrics grown on it obtained by ellipsometry.
Kasikov, Aarne; Kahro, Tauno; Matisen, Leonard; Kodu, Margus; Tarre, Aivar; Seemen, Helina; Alles, Harry. Applied Surface Science 437 (2018) 410–417; doi: dx.doi.org/10.1016/j.apsusc.2017.08.109.
Atomic layer deposition and properties of ZrO2-Fe2O3 thin films.
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena; García, Héctor. Beilstein J. Nanotechnol 9 (2018) 119–128; doi: 10.3762/bjnano.9.14.
Atomic layer deposition of zirconium dioxide from zirconium tetraiodide and ozone.
Kukli, Kaupo; Kemell, Marianna; Mizohata, Kenichiro; Vehkamäki, Marko; Kalam, Kristjan; Castán, Helena; Dueñas, Salvador; Link, Joosep; Stern, Raivo; Ritala, Mikko and Leskelä, Markku. ECS J. Solid State Sci. Technol. 7 (2018) 2 P1-P8; doi: 10.1149/2.0041802jss.

2017

Enhanced Flexibility and Electron Beam-controlled Shape Recovery in Alumina-Coated Au and Ag Core-Shell Nanowires.
Sergei Vlassov; Boris Polyakov; Mikk Vahtrus; Magnus Mets; Mikk Antsov; Sven Oras; Aivar Tarre; Tõnis Arroval; Rünno Lõhmus; Jaan Aarik. Nanotechnology 28 (2017) 50 505707; doi: https://doi.org/10.1088/1361-6528/aa973c.
Colorimetric gas detection by the varying thickness of a thin film of ultrasmall PTSA-coated TiO2 nanoparticles on a Si substrate.
Joost, Urmas; Šutka, Andris; Visnapuu, Meeri; Tamm, Aile; Lembinen, Meeri; Antsov, Mikk; Utt, Kathriin; Smits, Krisjanis; Nõmmiste, Ergo; Kisand, Vambola. Beilstein Journal of Nanotechnology 8 (2017) 229−236; doi: dx.doi.org/10.3762/bjnano.8.25.
Atomic layer deposition of titanium oxide films on As-synthesized magnetic Ni particles: Magnetic and safety properties.
Peep, Uudeküll; Jekaterina, Kozlova; Hugo, Mändar; Joosep, Link; Mariliis Sihtmäe; Sandra, Käosaar; Irina, Blinova; Kaja, Kasemets; Anne, Kahru; Raivo, Stern; Tanel, Tätte; Kaupo, Kukli; Aile, Tamm. Journal of Magnetism and Magnetic Materials 429 (2017) 299−304; doi: https://doi.org/10.1016/j.jmmm.2017.01.045.
Luminescence properties of Er3+ doped zirconia thin films and ZrO2/Er2O3 nanolaminates grown by atomic layer deposition.
Eduard Aleksanyan, Marco Kirm, Eduard Feldbach, Kaupo Kukli, Sven Lange, Ilmo Sildos, Aile Tamm. Optical Materials 74 (2017) 27-33; doi: https://doi.org/10.1016/j.optmat.2017.05.003.
Elemental and Raman investigation of 13th - 14th and 16th century enamelled glass beakers found in Estonia.
Niilisk, Ahti; Ritslaid, Peeter; Kikas, Jaak; Haak, Arvi; Mäesalu, Ain. Journal of Archaeological Science: Reports 16 (2017) 205−212; doi: dx.doi.org/10.1016/j.Jasrep.2017.10.016.
Heat-treatment effects on the ORR activity of Pt nanoparticles deposited on multi-walled carbon nanotubes using magnetron sputtering technique.
Hussain, S.; Erikson, H.; Kongi, N.; Merisalu, M.; Ritslaid, P.; Sammelselg, V.; Tammeveski, K. International Journal of Hydrogen Energy 42 (2017) 9 5958−5970; doi: dx.doi.org/10.1016/j.ijhydene.2016.11.164.
Reflectance calculations of anisotropic dielectric constants of graphene-like two-dimensional materials.
Adamson, P. Applied Optics 56 (2017) 28 7832–7840; doi: dx.doi.org/10.1364/AO.56.007832.
A sensitive reflection method for optical diagnostics of graphene layers.
Adamson, P. Optik: International Journal for Light and Electron Optics 138 (2017) 180-191; doi: dx.doi.org/10.1016/j.ijleo.2017.02.086.
A new ellipsometric approach for determining dielectric function of graphene in the infrared spectral region.
Adamson, P. Journal of Modern Optics 64 (2017) 3 272-279; doi: dx.doi.org/10.1080/09500340.2016.1229510.
Enhanced visibility of graphene: the effect of the Brewster angle.
Adamson, P. Optica Applicata 47 (2017) 3 363–372; doi: dx.doi.org/10.5277/oa170303.
Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films.
Kukli, Kaupo; Kemell, Marianna; Vehkamäki, Marko; Heikkilä, Mikko J.; Mizohata, Kenichiro; Kalam, Kristjan; Ritala, Mikko; Leskelä, Markku; Kundrata, Fröhlich, Karol. AIP Advances 7 (2017) 025001; doi:dx.doi.org/10.1063/1.4975928.
Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films.
Aile Tamm; Kristjan Kalam; Helina Seemen; Jekaterina Kozlova; Kaupo Kukli; Jaan Aarik; Joosep Link; Raivo Stern; Salvador Dueñas and Helena Castán. ACS Omega 2 (2017) 12 pp 8836–8842; doi:10.1021/acsomega.7b01394.
Properties of Zirconium Oxide and Cobalt Ferrite Layered Nanocomposite.
Aile Tamm, Urmas Joost, Mats Mikkor, Kristjan Kalam, Hugo Mändar, Helina Seemen, Joosep Link, Raivo Stern, Helena Castan, Salvador Duenas and Kaupo Kukli. ECS Journal of Solid State Science and Technology 6 (2017) 12 P886-P892; doi: 10.1149/2.0331712jss.
Graphene functionalised by laser-ablated V2O5 for a highly sensitive NH3 sensor.
Kodu, Margus; Berholts, Artjom; Kahro, Tauno; Kook, Mati; Ritslaid, Peeter; Seemen, Helina; Avarmaa, Tea; Alles, Harry; Jaaniso, Raivo. Beilstein Journal of Nanotechnology 8 (2017) 571–578; doi:10.3762/bjnano.8.61.

2016

Highly sensitive NO2 sensors by pulsed laser deposition on graphene.
Kodu, Margus; Berholts, Artjom; Kahro, Tauno; Avarmaa, Tea; Kasikov, Aarne; Niilisk, Ahti; Alles, Harry; Jaaniso, Raivo. Applied Physics Letters 109 (2016) 113108; doi: 10.1063/1.4962959.
Atomic layer deposition of aluminum oxide on modified steel substrates.
Kukli, Kaupo; Salmi, Emma; Jõgiaas, Taivo; Zabels, Roberts; Schuisky, Mikael; Westlinder, Jörgen; Mizohata, Kenichiro; Ritala, Mikko; Leskelä, Markku. Surface & Coatings Technology 304 (2016) 1−8; doi: 10.1016/j.surfcoat.2016.06.064.
Bismuth iron oxide thin ﬁlms using atomic layer deposition of alternating bismuth oxide and iron oxide layers.
Puttaswamy, Manjunath; Vehkamäki, Marko; Kukli, Kaupo; Dimri, Mukesh Chandra; Kemell, Marianna; Hatanpää, Timo; Heikkilä, Mikko J.; Mizohata, Kenichiro; Stern, Raivo; Ritala, Mikko; Leskelä, Markku. Thin Solid Films 611 (2016) 78−87; doi: 10.1016/j.tsf.2016.05.006.
MANOS performance dependence on ALD Al2O3 oxidation source.
Nikolaou, Nikolaos; Dimitrakis, Panagiotis; Normand, Pascal; Speliotis, Thanassis; Kukli, Kaupo; Niinistö, Jaakko; Mizohata, Kenichiro, Mizohata; Ritala, Mikko; Leskelä, Markku; Ioannou-Sougleridis, Vassilios. Microelectronic Engineering 159 (2016) 127−131; doi: /10.1016/j.mee.2016.03.021.
Plasmon resonance effect caused by gold nanoparticles formed on titanium oxide films.
Aile, Tamm; Ilona, Oja, Acik; Tõnis Arroval; Aarne, Kasikov; Helina Seemen; Malle, Krunks; Arvo, Mere; Kaupo Kukli; Jaan, Aarik. Thin Solid Films (2016) 449−455; doi: 10.1016/j.tsf.2016.08.059.
Quasicubic α-Fe2O3 nanoparticles embedded in TiO2 thin films grown by atomic layer deposition.
Tamm, Aile; Seinberg, Liis; Kozlova, Jekaterina; Link, Joosep; Pikma, Piret; Stern, Raivo; Kukli, Kaupo. Thin Solid Films 612 (2016) 445−449; doi: 10.1016/j.tsf.2016.06.036.
(Invited) A Complete Suite of Experimental Techniques for Electrical Characterization of Conventional and Incoming High-k Dielectric-Based Devices.
Duenas, S.; Castán, H.; García, H.; Arroval, T.; Tamm, A.; Kukli, K.; Aarik, J. ECS Transactions 72 (2) (2016) 153−165, doi: 10.1149/07202.0153ecst.
An oxygen reduction study of graphene-based nanomaterials of different origin.
Lilloja, J.; Kibena-Põldsepp, E.; Merisalu, M.; Rauwel, P.; Matisen, L.; Niilisk, A.; Cardoso, E.S.F.; Maia, G.; Sammelselg, V.; Tammeveski, K. Catalysts 6 (7) (2016) 108; doi:catal6070108.
Development of thin ceramic-graphene nanolaminated coating for corrosion protection of stainless steel.
Mondal, Jayanta; Marques, Andreia; Aarik, Lauri; Kozlova, Jekaterina; Simões, Alda; Sammelselg, Väino. Corrosion Science 105 (2016) 161−169; doi:10.1016/j.corsci.2016.01.013.
Electrocatalysis of oxygen reduction on multi-walled carbon nanotube supported copper and manganese phthalocyanines in alkaline media.
Kaare, K.; Kruusenberg, I.; Merisalu, M.; Matisen, L.; Sammelselg, V.; Tammeveski, K. Journal of Solid State Electrochemistry 20 (4) (2016) 921−929; doi: 10.1007/s10008-015-2990-9.
Electrochemical properties of gold and glassy carbon electrodes electrografted with an anthraquinone diazonium compound using the rotating disc electrode method.
Mooste, M.; Kibena-Põldsepp, E.; Marandi, M.; Matisen, L.; Sammelselg, V.; Tammeveski, K. RSC Advances 6 (47) (2016) 40982−40990; doi: 10.1039/c6ra05609a.
Raman characterization of stacking in multi-layer graphene grown on Ni.
Ahti Niilisk, Jekaterina Kozlova, Harry Alles, Jaan Aarik, Väino Sammelselg. Carbon 98 (2016) 658−665; doi: 10.1016/j.carbon,2015.11.050.

2015

Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure.
Möldre, Kristel; Aarik, Lauri; Mändar, Hugo; Niilisk, Ahti; Rammula, Raul; Tarre, Aivar; Aarik, Jaan. Journal of Crystal Growth 428 (2015) 86−92; doi: https://doi.org/10.1016/j.jcrysgro.2015.07.029.
Optical and luminescence characterization of LiBaAlF6 single crystals.
I. N. Ogorodnikov, S. I. Omelkov, V. A. Pustovarov, A. Kasikov, M. Kirm. Optical Materials 39 (2015) 52−57; doi: https://doi.org/10.1016/j.optmat.2014.10.063.
Enhanced oxygen reduction reaction activity with electrodeposited Ag on manganese oxide–graphene supported electrocatalyst.
Shypunov, I.; Kongi, N.; Kozlova, J.; Matisen, L.; Ritslaid, P.; Sammelselg, V.; Tammeveski, K. Electrocatalysis 6 (2015) 5 465−471; doi: dx.doi.org/10.1007/s12678-015-0266-x.
Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films.
Tamm, A.; Kozlova, J.; Arroval, T.; Aarik, L.; Ritslaid, P.; Garcıa, H.; Castan, H.; Duenas, S.; Kukli, K.; Aarik, J. Chemical Vapor Deposition 21 (2015) 181-187; doi: dx.doi.org/10.1002/cvde.201507170 .
Correlation-free reflection diagnostics of graphene-like surface layers in the infrared region.
Adamson, P. Surface and interface Analysis 47 (2015)13 1161–1165; doi:10.1002/sia.5868.
Mechanical properties of aluminium, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition.
Taivo Jõgiaas, Roberts Zabels, Aile Tamm, Maido Merisalu, Irina Hussainova, Mikko Heikkilä, Hugo Mändar, Kaupo Kukli, Mikko Ritala, Markku Leskelä, Elsevier 282 (2015) 36-42; doi:10.1016/j.surfcoat.2015.10.008.
Effect of atomic layer deposited aluminium oxide on mechanical properties of porous silicon carbide.
Taivo Jõgiaas, Lauri Kollo, Jekaterina Kozlova, Aile Tamm, Irina Hussainova, Kaupo Kupli, Elsevier 41 (6) (2015) 7519-7528; doi:10.1016/j.ceramint.2015.02.074.
Graphene-polypyrrole thin hybrid corrosion resistant coatings for copper.
Maido Merisalu, Tauno Kahro, Jekaterina Kozlova, Ahti Niilisk, Aleksandr Nikolajev, Margus Marandi, Aare Floren, Harry Alles, Väino Sammelselg, Synthetic Metals 200 (2015) 16-23.
Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition
Aile Tamm, Jekaterina Kozlova, Lauri Aarik, Jaan Aarik, Kaupo Kukli, Joosep Link, and Raivo Stern. Journal of Vacuum Science & Technology A 33, 01A127 (2015); doi: 10.1116/1.4902079

Raman modes in transferred bilayer CVD graphene.
Niilisk Ahti, Kahro Tauno, Kiisk Valter, Rähn Mihkel, Alles Harry, Aarik Jaan, Sammelselg Väino. Open Physics, 13(1) (2015) 34 - 40 .

2014

Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes.
Katsuhisa Murakami, Mathias Rommel, Boris Hudec, Alica Rosová, Kristína Hušeková, Edmund Dobročka, Raul Rammula, Aarne Kasikov, Jeong Hwan Han, Woongkyu Lee, Seul Ji Song, Albena Paskaleva, Anton J. Bauer, Lothar Frey, Karol Fröhlich, Jaan Aarik, and Cheol Seong Hwang. ACS Appl. Mater. Interfaces 6 (2014) 2486-2492; doi: dx.doi.org/10.1021/am4049139.
Electrochemical oxygen reduction behaviour of platinum nanoparticles supported on carbon nanotube/titanium dioxide composites.
Jukk, K.; Kongi, N.; Tarre, A.; Rosental, A.; Treshchalov, A.B.; Kozlova, J.; Ritslaid, P.; Matisen, L.; Sammelselg, V.; Tammeveski, K Journal of Electroanalytical Chemistry 735 (2014) 68-76; doi: dx.doi.org/10.1016/j.jelechem.2014.10.008.
Photo-activated oxygen sensitivity of graphene at room temperature.
Artjom Berholts, Tauno Kahro, Aare Floren, Harry Alles, Raivo Jaaniso, Applied Physics Letters 105 (16) (2014) 163111.
Modification of hematite electronic properties with trimethyl aluminum to enhance the efficiency of photoelectrodes.
Massimo Tallarida, Chittaranjan Das, Dejan Cibrev, Kaupo Kukli, Aile Tamm, Mikko Ritala, Teresa Lana-Villarreal, RobertoGómez, Markku Leskelä, Dieter Schmeisser, The Journal of Physical Chemistry Letters 5(20) (2014) 3582-3587.
Holmium and titanium oxide nanolaminates by atomic layer deposition. Kaupo Kukli, Jun Lu, Josep Link, Marianna Kemell, , Esa Puukilainen, Mikko Heikkilä, Roland Hoxha, Aile Tamm, Lars Hultman, Raivo Stern, Mikko Ritala, Markku Leskelä, Thin Solid Films 565 (2014) 165-171.

Holmium titanium oxide thin films grown by atomic layer deposition, Kaupo Kukli, Marianna Kemell, Mukesh Chandra Dimri, Esa Puukilainen, Aile Tamm, Raivo Stern, Mikko Ritala, Markku Leskelä, Thin Solid Films 565 (2014) 261–266.

Temperature induced inversion of oxygen response in CVD graphene on SiO2. Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Väino. Sensors and Actuators B-Chemical, 190 (2014) 1006 - 1016.

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O. Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinistö, Jaakko; Mändar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Väino; Aarik, Jaan. Thin Solid Films, 565 (2014) 37 - 44.

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin ﬁlms from hydrogen-free precursors, Lauri Aarik, Tõnis Arroval, Raul Rammula, Hugo Mändar, Väino Sammelselg, Boris Hudec, Kristina Hušekov´a, Karol Fröhlich, Jaan Aarik, Thin Solid Films (2014), doi: 10.1016/j.tsf.2014.06.038

Atomic layer deposition of ZrO2 for graphene-based multilayer structures: In situ and ex situ characterization of growth process. Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aidla, Aleks; Lu, Jun; Kiisler, Alma-Asta; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Hultman, Lars; Sammelselg, Väino; Kukli, Kaupo; Aarik, Jaan (2014). Physica Status Solidi A - Applications and Materials Science, 397 - 402.

Yttria stabilized zirconia microtubes for microfluidics under extreme conditions. Tätte, Tanel; Part, Marko; Talviste, Rasmus; Hanschmidt, Kelli; Utt, Katriin; Mäeorg, Uno; Jõgi, Indrek; Kiisk, Valter; Mändar, Hugo; Nurk, Gunnar; Rauwel, Protima (2014). RSC Advances, 4(34), 17413 - 17419.

Resistive switching behavior and electrical properties of TiO2:Ho2O3 and HoTiOx based MIM capacitors. H. García, H. Castán, S. Dueñas, E. Pérez, L. A. Bailón, K. Kukli, M. Ritala, M. Leskelä, , Mater. Res. Soc. Symp. Proc. 1691 (2014).

Study of the curing mechanism of metal alkoxide liquid threads for the synthesis of metal oxide fibers or microtubes. Part, Marko; Hanschmidt, Kelli; Jõgi, Jakob; Rauwel, Erwan; Seisenbaeva, Gulaim A.; Kessler, Vadim G.; Tätte, Tanel (2014). RSC Advances, 4, 12545 - 12554.

Spectroscopic properties of Eu-doped Y-stabilized ZrO2 microtubes. Utt, K.; Part, M.; Tätte, T.; Kiisk, V.; Brik, M.G.; Chaykin, A.A.; Sildos, I. (2014). Journal of Luminescence, 152 (2014) 125-128

Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes. Part, Marko; Tamm, Aile; Kozlova, Jekaterina; Mändar, Hugo; Tätte, Tanel; Kukli, Kaupo (2014). Thin Solid Films, 553, 30 - 32.

Influence of growth temperature on structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic layer deposition processes, Arroval Tõnis, Aarik Lauri, Rammula Raul, Mändar Hugo, Hudec Boris, Hušeková Kristina, Fröhlich Karol, Aarik Jaan. Physica Status Solidi A - Applications and Materials Science, 211(2014) 425 - 432. DOI 10.1002/pssa.201330086

Correlation-free ellipsometric characterization of uniaxially anisotropic nanolayers
Adamson, P. Optik: International Journal for Light and Electron Optics,125(1)(2014),489 – 494.

Ellipsometry of anisotropic (sub)nanometric dielectric films on absorbing materials
P.Adamson Journal of Modern Optics, 61(5) (2014) 424 – 434.

Infrared ellipsometry of nanometric anisotropic dielectric layers on absorbing materials
P.Adamson Infrared Physics & Technology, 64 (2014) 108 – 114.

Analytic determination of n, k and d of two-dimensional materials by ellipsometry and reflectivity
P.Adamson Applied Optics, 53(21) (2014) 4804 – 4810.

Characteristic Brewster angles for anisotropic interfaces
P.Adamson Optik: International Journal for Light and Electron Optics, 125(24) (2014) 7247 – 7257.

Sputter-deposited Pt nanoparticle/multi-walled carbon nanotube composite catalyst for oxygen reduction reaction. Jukk, K.; Alexeyeva, N.; Ritslaid, P.; Kozlova, J.; Sammelselg, V.; Tammeveski, K (2013). Journal of Electroanalytical Chemistry, 708 (49), 31−38

Atomic layer deposition of aluminum oxide films on graphene. Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan (2013). IOP Conference Series: Materials Science and Engineering, 49, 012014

Atomic layer deposition of ZrO₂ for graphene-based multilayer structures: in situ and ex situ characterization of growth process, Aile Tamm, Jekaterina Kozlova, Lauri Aarik, Aleks Aidla, Jun Lu, Alma-Asta Kiisler, Aarne Kasikov, Peeter Ritslaid, Hugo Mändar, Lars Hultman, Väino Sammelselg, Kaupo Kukli, and Jaan Aarik, Phys. Status Solidi A, 1–7 (2013) DOI 10.1002/pssa.201330106.

Atomic layer deposition of alumina on g-Al2O3 nanofibres, Taivo Jõgiaas, Tõnis Arroval, Lauri Kollo, Jekaterina Kozlova, Tanel Käämbre, Hugo Mändar, Aile Tamm, Irina Hussainova, and Kaupo Kukli, Phys. Status Solidi A, 1–6 (2013) / DOI 10.1002/pssa.201330083

Nanosecond laser treatment of graphene, Valter Kiisk, Tauno Kahro, Jekaterina Kozlova, Leonhard Matisen, Harry Alles, Appl. Surf. Science 276 (2013) 133–137.

Temperature induced inversion of oxygen response in CVD graphene on SiO₂, R. Jaaniso, T. Kahro, J. Kozlova, J. Aarik, L. Aarik, H. Alles, A. Floren, A. Gerst, A. Kasikov, A. Niilisk, V. Sammelselg, Sensor and Acutuators B: Chemical (2013).

Atomic layer deposition of epitaxial HfO2 thin filmson r-cut sapphire, H. Mändar, R. Rammula, A. Aidla, J. Aarik, J. Mater. Res 28(13) (2013) 1680-1686.

Atomic layer deposition of TiO2 from TiCl4 and O3, L. Aarik, T. Arroval, R. Rammula, H. Mändar, V. Sammelselg, J. Aarik, Thin Solid Films 542 (2013) 100-107.

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition, V. Sammelselg, I. Netsipailo, A. Aidla, A. Tarre, L. Aarik, J. Asari, P. Ritslaid, J. Aarik, Thin Solid Films, 452 (2013) 219-224.

Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: growth of high-permittivity dielectrics with low leakage current, J. Aarik, T. Arroval, L. Aarik, R. Rammula, A. Kasikov, H. Mändar, B. Hudec, K. Husekova, K. Fröhlich, J. Cryst. Growth 382 (2013) 61-66.

Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor, B. Hudec, K. Huseková, A. Rosová, J. Soltýs, R. Rammula, A. Kasikov, T. Uustare, M. Micusik, M. Omastová, J. Aarik, K. Fröhlich, J. Phys. D: Appl. Phys. 46 (2013) 385304-1-8.

Structural and magnetic studies on iron oxide and iron-magnesium oxide thin films deposited using ferrocene and (dimethylaminomethyl)ferrocene precursors, Kukli, Kaupo; Dimri, Mukesh Chandra; Tamm, Aile; Kemell, Marianna; Käämbre, Tanel; Vehkamäki, Marko; Puttaswamy, Manjunath; Stern, Raivo; Kuusik, Ivar; Kikas, Arvo; Tallarida, Massimo; Schmeisser, Dieter; Ritala, Mikko; Leskelä, Markku, ECS Journal of Solid State Sience and Technology 3 (2013) N45 - N54.

Epitaxial single and double nanolayers of SnO2 and TiO2 for Resistive Gas Sensors, Rosental, A; Tarre, A.; Gerst, A.; Kasikov, A.; Lu, J.; Ottosson, M.; Uustare, T. Sensors Journal, IEEE, 99 (2013).
Atomic layer deposition of epitaxial TiO2 II on c-sapphire , Aivar Tarre, Kristel Möldre, Ahti Niilisk, Hugo Mändar, Jaan Aarik, and Arnold Rosental J. Vac. Sci. Technol., A 31 (2013) 01A118.
Oxygen reduction on electrodeposited Pd coatings on glassy carbon Erikson H., Liik M., Sarapuu A., Kozlova J., Sammelselg V., Tammeveski K., Electrochim. Acta. 88 (2013) 513-518
Influence of separator properties on electrochemical performance of electrical double-layer capacitors
K. Tõnurist, T. Thomberg, A. Jänes, T. Romann, V. Sammelselg, E. Lust, J. Electroanal. Chem. 689 (2013) 58-20
Electroreduction of oxygen on sputter-deposited Pd nanolayers on multi-walled carbon nanotubes
K. Jukk, N. Alexeyeva, A. Sarapuu, P.Ritsalaid, V. Sammelselg, K.Tammeveski, Internat. J. Hydrog. 38 (2013) 3614-3620
Electrocatalysis of oxygen reduction on electrodeposited Pd coatings on gold H. Erikson, M. Liik, A. Sarapuu, M. Marandi, V. Sammelselg, K.Tammeveski, J. Electroanal. Chem. 691 (2013) 35-41
Electrochemical Modification of Gold Electrodes with Azobenzene DerivativesElectrochemical Modification of Gold Electrodes with Azobenzene Derivatives by Diazonium Reduction, Kibena E., Marandi M., Venarusso L., Maia G., Matisen L., Sammelselg V., Tammeveski K., Chem. Phys. Chem. 14 (2013) 1043-1054
Electrochemical Reduction of Oxygen on Heat-Treated Pd Nanoparticle/Multi-Walled Carbon Nanotube Composites in Alkaline Solution, K. Jukk, N. Alexeyeva, P. Ritslaid, J. Kozlova, V. Sammelselg, K. Tammeveski, Electrocatalysis. 4 (2013) 42-48
Chemical functionalization of a polyvinylidene fluoride surface, Liiv J., Zekker I., Panov D., Sammelselg V., Tenno T., Järv J.,Polymer Journal 45 (2013) 313-317
Atomic layer deposition of high-k dielectrics on carbon nanoparticles, A.Tamm, A.-L. Peikolainen, J. Kozlova, H. Mändar, A. Aidla, R. Rammula, L. Aarik, K. Roosalu, J. Lu, L. Hultman, M. Koel, K. Kukli, J. Aarik. Thin Solid Films 538 (2013) 16-20 .

2012

Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles, A. Tamm, M. C. Dimri, J. Kozlova, A. Aidla, T. Tätte, T. Arroval, U. Mäeorg, H. Mändar R. Stern, K. Kukli, J. Cryst. Growth 343 (2012) 21–27.
Tribological properties of PVD coatings with lubricating films, L. Lind, E. Adoberg, L. Aarik, P. Kulu, R. Veinthal, Estonian Journal of Engineering 18(3), (2013) 193 - 201.
Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories
Nikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Vassilios Ioannou-Sougleridis, Konstantinos Giannakopoulos, Konstantina Mergia, Kaupo Kukli, Jaakko Niinistö, Mikko Ritala, Markku Leskelä, Original Research Article Solid-State Electronics 68 (2012) 38-47.
Atomic layer deposition of high-permittivity TiO2 dielectrics with low leakage current on RuO2 in TiCl4-based processes, J. Aarik, B. Hudec, K. Husekova, R. Rammula, A. Kasikov, T. Arroval, T. Uustare, K. Fröhlich, Semicond. Sci. Technol. 27 (2012) 074007
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen Original Research
Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Spohn, Scott Meiere, David M. Thompso Thin Solid Films Volume 520, Issue 7 (2012) Pages 2756-2763.
Formation of Nanometric Polypyrrole Films on Au (111): a STM,SEM and XPS Study, M. Marandi, S. Kallip, L. Matisen, J. Tamm, V. Sammelselg, Synth. Met., 162 (2012) 162-170
Blocking properties of gold electrodes modified with 4-nitrophenyl and 4-decylphenyl groups
M. Kullapere, M. Marandi, L. Matisen, , F. Mirkhalaf, Adriana E. Carvalho, G. Maia V. Sammelselg, K.Tammeveski J. Solid State Electrochem. 16 (2012) 569-578
Electrocatalytic oxygen reduction on silver nanoparticle/multi-walled carbon nanotube modified glassy carbon electrodes in alkaline solution, L. Tammeveski, H. Erikson, A. Sarapuu J. Kozlova, P. Ritslaid, V. Sammelselg, K. Tammeveski. Electrochem. Comm. , 20 (2012) 15-18
Prussian Blue modified solid carbon nanorod whisker paste composite electrodes: evaluation towards the electroanalytical sensing of H2O2, Siimenson, C.; Kruusma, J.; Anderson, E.; Merisalu, M.; Sammelselg, V.; Lust, E.; Banks, C.E. Inter. J. Electrochem.(2012) article ID 238419
Atomic Layer Deposition of High-k Oxides on Graphene,
Harry Alles, Jaan Aarik, Jekaterina Kozlova, Ahti Niilisk, Raul Rammula and Väino Sammelselg, Atomic Layer Deposition of High-k Oxides on Graphene, Graphene - Synthesis, Characterization, Properties and Applications, Jian Ru Gong (Ed.),(2011) ISBN: 978-953-307-292-0, InTech
Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes
B. Hudec, K. Hušekova, A. Tarre, J.H. Han, S. Han, A. Rosova, W. Lee, A. Kasikov, S.J. Song, J. Aarik, C.S. Hwang, K. Fröhlich, Microelectron. Engineering, 88 (2011) 1514–1516.
Post-deposition processing and oxygen content of TiO2-based capacitors
K. Fröhlich, B. Hudec, J. Aarik, A. Tarre, D. Macajdik, A. Kasikov, K. Hušekova, Š. Gaži,, Microelectron. Engineering, 88 (2011) 1525–1528.
Analysis of leakage current mechanisms in RuO2-TiO2- RuO2 MIM structures
J. Racko, M. Mikolasek, L. Harmatha, J. Breza, B. Hudec; K. Fröhlich, J. Aarik, A. Tarre, R. Grazner, F. Schwierz, J. Vac. Sci. Technol. B29(1) (2011) 01AC08-1–8.
Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer, B. Hudec, K. Hušekova, E. Dobročka, J. Aarik, R. Rammula, A. Kasikov, A. Tarre, A. Vince, K. Fröhlich, J. Vac. Sci. Technol. B29(1) (2011) 01AC09-1–5.
Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen
Kaupo Kukli , Marianna Kemell, Esa Puukilainen, Jaan Aarik, Aleks Aidla, Timo Sajavaara, Mikko Laitinen, Massimo Tallarida, Jonas Sundqvist, Mikko Ritala, and Markku Leskelä Journal of The Electrochemical Society, 158 (2011) D158-D165.
Atomic layer deposition of HfO₂: Effect of structure development on growth rate, morphology and optical properties of thin films R. Rammul, J. Aarik, H. Mändar, P. Ritslaid, V. Sammelselg, Applied Surface Science 257 (2010)1043.
Atomic Layer Deposition and Characterization of Zirconium Oxide – Eerbium Oxide Nanolaminates
A. Tamm, Mikko Heikkilä, Marianna Kemell, Jekaterina Kozlova, Kaupo Kukli, Väino Sammelselg, Mikko Ritala, Markku Leskelä, Thin Solid Films (2010) doi:10.1016/j.tsf.2010.08.111
Reflection characterization of nanoscopically stratified surface structures and optical probing of anisotropic nanolayers
P. Adamson, e-Journal of Surface Science and Nanotechnology 8 (2010) 167-173
Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films
A. Tamm, Marianna Kemell, Jekaterina Kozlova, Timo Sajavaara, Massimo Tallarida, Kaupo Kukli, Väino Sammelselg, Mikko Ritala, and Markku Leskelä, Journal of The Electrochemical Society, 157 (2010) G193.
Investigation of ZrO2–Gd2O3 Based High-k Materials as Capacitor Dielectrics
Indrek Jõgi, Aile Tamm, Kaupo Kukli, Marianna Kemell, Jun Lu, Timo Sajavaara, Mikko Ritala and Markku Leskelä, Journal of The Electrochemical Society, 157 (2010) G202.
Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O
Harry Alles , Jaan Aarik, Aleks Aidla, Aurelien Fay, Jekaterina Kozlova, Ahti Niilisk, Martti Pärs, Mihkel Rähn, Maciej Wiesner, Pertti Hakonen and Väino Sammelselg, Central European Journal of Physics, DOI 10.2478/s11534-010-0040-x
Properties of HfO2 and HfO2: Y films grown by atomic layer deposition in an advanced monocyclopentadienyl-based process
A. Tamm , K. Kukli , J. Niinistö , J. Lu , M. Ritala and M. Leskelä IOP Conference Series: Materials Science and Engineering, 8 (2010) 012022
Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1'-methyl-ruthenocene
Kaupo Kukli , Jaan Aarik, Aleks Aidla, Teet Uustare, Indrek Jõgi , Jun Lu, Massimo Tallarida, Marianna Kemell, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, Journal of Crystal Growth, Volume 312, Issues 12-13, 1 June 2010, Pages 2025-2032,
AFM study of the adsorption of pyrrole and formation of the polypyrrole film on gold surface.
M. Marandi, S.Kallip, V.Sammelselg, J.Tamm, 2010 Electrochem. Commun. 2010 12 Pages 854-858.
Atomic layer deposition of high capasitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures ,
Jõgi, I.; Kukli, K; Ritala, M.; Leskelä,M.; Aarik, J.; Aidla, A.; Jun Lu, Microelectronic Engineering 87 (2010) 144-149.
Reflection of electromagnetic plane waves in a long-wavelength approximation from a multilayer system of anisotropic transparent films on non-absorbing isotropic medium
P. Adamson, Waves in Random and Complex Media 20 (2010) 443-471

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Publications from 2019-2012 by the laboratory personnel

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2012